Lê Thị Hồng Nhung, L. T. H. N. (2025). Semiconductor Wafer Fab Yield: Quantifying Defect Escape, Metrology Uncertainty, and Time-to-Containment Under Process Drift and Inspection Capacity Constraints. Techne: Journal of Engineering, Technology and Industrial Applications, 1(4), 114-121. https://ejournal.kalampractica.com/index.php/techne/article/view/42