LÊ THỊ HỒNG NHUNG, Lê Thị Hồng Nhung. Semiconductor Wafer Fab Yield: Quantifying Defect Escape, Metrology Uncertainty, and Time-to-Containment Under Process Drift and Inspection Capacity Constraints. Techne: Journal of Engineering, Technology and Industrial Applications, [S. l.], v. 1, n. 4, p. 114–121, 2025. Disponível em: https://ejournal.kalampractica.com/index.php/techne/article/view/42. Acesso em: 14 mar. 2026.